1. Measurement of short-range PSF in EBL;Micro and Nano Engineering;2024-03
2. Calculation of the Absorbed Electron Energy 3D Distribution by the Monte Carlo Method, Presentation of the Proximity Function by Three Parameters α, β, η and Comparison with the Experiment;Materials;2022-05-30
3. Electron beam lithography in thick negative tone chemically amplified resist: Controlling sidewall profile in deep trenches and channels;Microelectronic Engineering;2014-11
4. Variation of backscatter electron intensity;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-11
5. Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam–direct-write lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-03