Thermal desorption spectroscopy of Xe at the Si(111) as a local probe for surface structures-Reference-Cited by-同舟云学术

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Thermal desorption spectroscopy of Xe at the Si(111) as a local probe for surface structures

Published:1985-05 Issue:3 Volume:3 Page:1588-1591
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Bartha J. W.,Barjenbruch U.,Henzler M.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.573137

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Selective Ablation of Xe from Silicon Surfaces: Molecular Dynamics Simulations and Experimental Laser Patterning;The Journal of Physical Chemistry A;2011-06-16

2. Kr and Xe on NaCl(100): pure phases and their miscibility;Surface Science;2001-02

3. An atomic beam diffraction study of a rare gas monolayer of square symmetry: Kr on (100) NaCl;Surface Science;1996-10

4. Cation incorporation rate limitations in molecular-beam epitaxy: Effects of strain and surface composition;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1989-03

5. Effects of strain and surface reconstruction on the kinetics of indium incorporation in MBE growth of InAs;Journal of Crystal Growth;1989-02

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