The use of a direct current saddle‐field plasma for the deposition of hydrogenated amorphous silicon-Reference-Cited by-同舟云学术

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The use of a direct current saddle‐field plasma for the deposition of hydrogenated amorphous silicon

Published:1991-05 Issue:3 Volume:9 Page:496-500
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Harry M.,Zukotynski S.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.577395

Cited by 28 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Laterally inherently thin amorphous-crystalline silicon heterojunction photovoltaic cell;Applied Physics Letters;2014-12-29

2. Back amorphous-crystalline silicon heterojunction (BACH) photovoltaic device with facile-grown oxide - PECVD SiNx passivation;Progress in Photovoltaics: Research and Applications;2014-04-25

3. The augmented saddle field discharge characteristics and its applications for plasma enhanced chemical vapour deposition;Journal of Applied Physics;2013-04-07

4. Optimal hydrogenated amorphous silicon/silicon nitride bilayer passivation of n-type crystalline silicon using response surface methodology;Applied Physics Letters;2012-10-22

5. Passivation study of the amorphous-crystalline silicon interface formed using DC saddle-field glow discharge;physica status solidi (a);2010-03

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