Investigation of roughened silicon surfaces using fractal analysis. II. Chemical etching, rapid thermal chemical vapor deposition, and thermal oxidation-Reference-Cited by-同舟云学术

Investigation of roughened silicon surfaces using fractal analysis. II. Chemical etching, rapid thermal chemical vapor deposition, and thermal oxidation

Published:1994-09 Issue:5 Volume:12 Page:2653-2661
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Spanos L.,Liu Q.,Irene E. A.,Zettler T.,Hornung B.,Wortman J. J.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.579085

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