Phase shift mask interferometric birefringence monitor-Reference-Cited by-同舟云学术

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Phase shift mask interferometric birefringence monitor

Published:2006 Issue:6 Volume:24 Page:2808
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

McIntyre Gregory R.,Neureuther Andrew

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Polarization phase-shifting interferometric technique for complete evaluation of birefringence;Applied Optics;2011-05-13

2. A Single Element Birefringence-Sensitive Interferometer;Journal of Optics;2008-12

3. Polarimetry of illumination for 193nm immersion lithography;Microelectronic Engineering;2008-07

4. In-situ polarimetry of illumination for 193-nm lithography;Optical Microlithography XXI;2008-03-14

5. Polarimetry of illumination for 193-nm lithography used for the manufacture of high-end LSIs;SPIE Proceedings;2007-11-29

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