Fourier transform infrared study of rapid thermal annealing of a‐Si:N:H(D) films prepared by remote plasma‐enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

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Fourier transform infrared study of rapid thermal annealing of a‐Si:N:H(D) films prepared by remote plasma‐enhanced chemical vapor deposition

Published:1995-05 Issue:3 Volume:13 Page:607-613
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Lu Z.,Santos‐Filho P.,Stevens G.,Williams M. J.,Lucovsky G.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.579794

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