The growth of thin films with high thickness uniformity using ultrahigh vacuum molecular beam deposition-Reference-Cited by-同舟云学术

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The growth of thin films with high thickness uniformity using ultrahigh vacuum molecular beam deposition

Published:1990-11 Issue:6 Volume:8 Page:3934-3937
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Hale C. H.,Muirhead I. T.,Fisher S. P.,Orr J. S.,Mathew J. G. H.,Prior K. A.,Walker A. C.,Smith S. D.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.576424

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. All-Optical Bistabilities in Reflection and Luminescence of Thin ZnSe Films;Optical Review;1995-11

2. Stress free and moisture insensitive silicon oxide dielectric films formed by molecular‐beam deposition;Journal of Applied Physics;1995-09

3. Molecular beam deposition of high quality silicon oxide dielectric films;Journal of Crystal Growth;1995-03

4. The Technology and Design of Molecular Beam Epitaxy Systems;Molecular Beam Epitaxy;1995

5. Improved method for determining the optical constants of thin films and its application to molecular-beam-deposited polycrystalline layers;Applied Optics;1993-10-01

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