Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
Author:
Affiliation:
1. Department of Chemical and Materials Engineering, University of Alberta, Edmonton T6G 1H9, Canada
2. Department of Electrical and Computer Engineering, University of Alberta, Edmonton T6G 1H9, Canada
Funder
Canadian Network for Research and Innovation in Machining Technology, Natural Sciences and Engineering Research Council of Canada
Alberta Innovates - Technology Futures
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.5091944
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3. SnO2 thin film deposition using atomic layer deposition technique: Properties and applications;Reference Module in Materials Science and Materials Engineering;2023
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