Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
Author:
Affiliation:
1. Department of Chemical and Materials Engineering, University of Alberta, Edmonton T6G 1H9, Canada
2. Department of Electrical and Computer Engineering, University of Alberta, Edmonton T6G 1H9, Canada
Funder
Canadian Network for Research and Innovation in Machining Technology, Natural Sciences and Engineering Research Council of Canada
Alberta Innovates - Technology Futures
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.5091944
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Facile fabrication of Sn/SnOx electrode as an efficient electrocatalyst for CO2 reduction to formate;Materials Today Communications;2023-06
2. SnO2 thin film deposition using atomic layer deposition technique: Properties and applications;Reference Module in Materials Science and Materials Engineering;2023
3. Atomic layer deposition of conductive and semiconductive oxides;Applied Physics Reviews;2022-12
4. Polycrystalline and high purity SnO2 films by plasma-enhanced atomic layer deposition using H2O plasma at very low temperatures of 60–90 °C;Vacuum;2022-02
5. Atmospheric atomic layer deposition of SnO2 thin films with tin(ii) acetylacetonate and water;Dalton Transactions;2022
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3