Mechanism of Si etching reaction in aqueous solutions-Reference-Cited by-同舟云学术

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Mechanism of Si etching reaction in aqueous solutions

Published:1993-01 Issue:1 Volume:11 Page:70
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Seo Young Hun

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electroless etching of Si with IO3– and related species;Nanoscale Research Letters;2012-06-20

2. Mn-activated Na2SiF6 red and yellowish-green phosphors: A comparative study;Journal of Applied Physics;2011-09-15

3. A yellow phosphor K2SiF6 activated by Mn2+ ions;Journal of Applied Physics;2010-09-15

4. Stain Etching Characteristics of Silicon(001) Surfaces in Aqueous HF∕K[sub 2]Cr[sub 2]O[sub 7] Solutions;Journal of The Electrochemical Society;2007

5. Wet and Dry Etching Materials;Handbook of Chemicals and Gases for the Semiconductor Industry;2002-07-15

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