Aberration correction for electron beam inspection, metrology, and lithography

Author:

Munro Eric1,Rouse John1,Liu Haoning1,Wang Liping1

Affiliation:

1. Munro’s Electron Beam Software Ltd., 14 Cornwall Gardens, London SW7 4AN, England, United Kingdom

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Multipole electrostatic system mathematical modeling;Vestnik of Saint Petersburg University. Applied Mathematics. Computer Science. Control Processes;2017

2. Novel electron monochromator for high resolution imaging and spectroscopy;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-09-12

3. A novel low energy electron microscope for DNA sequencing and surface analysis;Ultramicroscopy;2014-10

4. A monochromatic, aberration-corrected, dual-beam low energy electron microscope;Ultramicroscopy;2013-07

5. Progress toward an aberration-corrected low energy electron microscope for DNA sequencing and surface analysis;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-11

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