Patterning large area plasmonic nanostructures on nonconductive substrates using variable pressure electron beam lithography-Reference-Cited by-同舟云学术

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Patterning large area plasmonic nanostructures on nonconductive substrates using variable pressure electron beam lithography

Published:2016-11 Issue:6 Volume:34 Page:06K801
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Babocký Jiří,Dvořák Petr,Ligmajer Filip,Hrtoň Martin,Šikola Tomáš,Bok Jan,Fiala Jiří

Funder

Grant Agency of the Czech Republic

MYES CR

Technology Agency of the Czech Republic

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4966959

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Towards understanding the surface rippling process by periodic reciprocal nanoscratching;Friction;2023-02-03

2. Study of the formation mechanism of bundle structures using AFM tip-based nanoscratching approach;Tribology International;2020-02

3. Altering the radiation chemistry of electron-beam lithography with a reactive gas: a study of Teflon AF patterning under water vapor;Nanotechnology;2019-05-01

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