Author:
Heidenreich R. D.,Ballantyne J. P.,Thompson L. F.
Cited by
30 articles.
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1. Analysis of Sub-0.15 µm Pattern Replicationin Synchrotron Radiation Lithography;Japanese Journal of Applied Physics;1993-12-30
2. Application of electron beam irradiation in microlithography;International Journal of Radiation Applications and Instrumentation. Part C. Radiation Physics and Chemistry;1991-01
3. Thin-film inorganic resists for submicron fabrication;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1990-05
4. Theoretical analysis of electron-beam exposure parameters and etching selectivity upon organosilicon bilayer resist images;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1987-01
5. Monte Carlo Methods and Microlithography Simulation for Electron and X-Ray Beams;Advances in Electronics and Electron Physics Volume 69;1987