Reduction of pumping time for a sputtering system by glow discharge cleaning-Reference-Cited by-同舟云学术

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Reduction of pumping time for a sputtering system by glow discharge cleaning

Published:1991-07 Issue:4 Volume:9 Page:2364-2368
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Kagatsume Akiko,Ueda Sinjiroo,Akiba Masakuni,Kawabe Takaya

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.577277

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Experimental results of a dc glow discharge source with controlled plasma floating potential for plasma immersion ion implantation;Journal of Physics D: Applied Physics;2000-06-23

2. The influence of a glow discharge treatment on surface modification and outgassing rate of stainless steel and titanium alloys;Vacuum;1996-04

3. Water vapor in vacuum systems;Vacuum;1996-04

4. Reduction of outgassing rate by glow discharge cleaning;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1995-05

5. Characterization of surface modifications of stainless steel samples after electron and ion bombardment by SEM, AES, and XPS;Fresenius' Journal of Analytical Chemistry;1995

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