Chemical mechanical polishing of Ge2Sb2Te5 in alkaline slurry-Reference-Cited by-同舟云学术

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Chemical mechanical polishing of Ge2Sb2Te5 in alkaline slurry

Published:2017-07 Issue:4 Volume:35 Page:041204
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Wang Hai-bo,Lu Shi-bin,Yang Jin,Jiang Xian-wei,Song Zhi-tang,Liu Wei-li

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4986473

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Impact of electron irradiation on semi-insulating and conductive β-Ga₂O₃ single crystals;Physical Chemistry Chemical Physics;2024

2. Effect of RF power and gas ratio on the sidewall of β-Ga₂O₃ films via inductively coupled plasma etching;Japanese Journal of Applied Physics;2023-01-01

3. Methods for synthesizing β-Ga2O3 thin films beyond epitaxy;Journal of Physics: Photonics;2021-07-01

4. Neutron irradiation and forming gas anneal impact on β-Ga2O3 deep level defects;Journal of Physics D: Applied Physics;2020-08-27

5. Nanowear of GeSbTe thin film under atmospheric environment;Applied Surface Science;2020-02

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