Electron cyclotron resonance plasma source for conductive film deposition
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.579309
Cited by 45 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Study of a reversible resistive switching mechanism in bismuth titanate deposited by electron cyclotron resonance sputtering;Japanese Journal of Applied Physics;2019-03-19
2. Note: Easy-to-maintain electron cyclotron resonance (ECR) plasma sputtering apparatus featuring hybrid waveguide and coaxial cables for microwave delivery;Review of Scientific Instruments;2016-06
3. Characterization of proton beam emission from an electron cyclotron resonance ion source;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2013-04
4. Thermal Improvement and Stability of Si3N4/GeNx/p- and n-Ge Structures Prepared by Electron-Cyclotron-Resonance Plasma Nitridation and Sputtering at Room Temperature;Japanese Journal of Applied Physics;2012-09-01
5. Thermal Improvement and Stability of Si$_{3}$N$_{4}$/GeN$_{x}$/p- and n-Ge Structures Prepared by Electron-Cyclotron-Resonance Plasma Nitridation and Sputtering at Room Temperature;Japanese Journal of Applied Physics;2012-08-28
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