Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
Author:
Affiliation:
1. Department of Chemistry, Carleton University, 1125 Colonel By Drive, Ottawa K1S 5B6, Canada
Funder
Natural Sciences and Engineering Research Council of Canada (NSERC)
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.4972469
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