Incorporation of fluorine in hydrogenated silicon carbide films deposited by pulsed glow discharge-Reference-Cited by-同舟云学术

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Incorporation of fluorine in hydrogenated silicon carbide films deposited by pulsed glow discharge

Published:2004-07 Issue:4 Volume:22 Page:1223-1228
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Jacobsohn L. G.,Afanasyev-Charkin I. V.,Cooke D. W.,Schulze R. K.,Averitt R. D.,Nastasi M.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1764820

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Alternative nano-structured thin-film materials used as durable thermal nanoimprint lithography templates;Nanotechnology;2016-01-19

2. Blue Shifting of Hydrogenated Silicon Carbide Multiple Quantum Wells;Key Engineering Materials;2011-06

3. Structural and optical characterization of fluorinated hydrogenated silicon carbide films deposited by pulsed glow discharge;Surface and Coatings Technology;2006-05

4. Chemical bonding investigation of amorphous hydrogenated Si–N alloys deposited by plasma immersion ion processing;Thin Solid Films;2006-01

5. Structural and optical investigation of plasma deposited silicon carbon alloys: Insights on Si-C bond configuration using spectroscopic ellipsometry;Journal of Applied Physics;2005-05-15

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