Control of nitrogen depth profile in ultrathin oxynitride films formed by pulse-time-modulated nitrogen beams-Reference-Cited by-同舟云学术

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Control of nitrogen depth profile in ultrathin oxynitride films formed by pulse-time-modulated nitrogen beams

Published:2004-03 Issue:2 Volume:22 Page:245-249
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Samukawa Seiji,Minemura Youichi,Fukuda Seiichi

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1641047

Cited by 23 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Investigation of spatial distribution of EEPFs and neutral species in nitrogen inductively coupled plasmas by 2D hybrid simulation;Physics of Plasmas;2023-09-01

2. Effect of electron energy distributions on the electron density in nitrogen inductively coupled plasmas;Plasma Sources Science and Technology;2022-10-01

3. Nitriding process for next-generation semiconductor devices by VHF (162 MHz) multi-tile push-pull plasma source;Applied Surface Science;2020-03

4. Nitridation of Si surface at the bottom of submicron trench using nitrogen neutral beam;Japanese Journal of Applied Physics;2015-05-21

5. Si etching with reactive neutral beams of very low energy;Journal of Applied Physics;2014-12-14

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