Anomalous low-temperature dopant diffusion from in situ doped polycrystalline and epitaxial Si layers into the monocrystalline Si substrate
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Published:1994-01
Issue:1
Volume:12
Page:387
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
1 articles.
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1. Gas-phase deposited thin-film silicon emitters for solar cells: high quality homoepitaxy at 325°C;Conference Record of the Twenty-Eighth IEEE Photovoltaic Specialists Conference - 2000 (Cat. No.00CH37036)