Phase transition behavior of reactive sputtering deposited Co–N thin films using transmission electron microscopy-Reference-Cited by-同舟云学术

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Phase transition behavior of reactive sputtering deposited Co–N thin films using transmission electron microscopy

Published:2004 Issue:3 Volume:22 Page:698
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:J. Vac. Sci. Technol. A

Author:

Fang Jau-Shiung,Yang Li-Chung,Hsu Chen-Siang,Chen Gin-Shiang,Lin Yen-Wei,Chen Giin-Shan

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

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4. Structural, electronic, and magnetic properties of Co4N thin films deposited using HiPIMS;Journal of Alloys and Compounds;2021-05

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