Facetless Bragg reflector surface-emitting AlGaAs/GaAs lasers fabricated by electron-beam lithography and chemically assisted ion-beam etching

Author:

Tiberio R. C.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 15 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Tunable distributed-feedback laser gratings for telecom applications, manufactured by electron-beam lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2002

2. Ion Beam Etching of Compound Semiconductors;Handbook of Advanced Plasma Processing Techniques;2000

3. Limits of Conventional Lithography;Nanotechnology;1999

4. Fabrication of electron beam generated, chirped, phase mask (1070.11–1070.66 nm) for fiber Bragg grating dispersion compensator;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-11

5. Lasing behavior of circular grating surface-emitting semiconductor lasers;Journal of the Optical Society of America B;1997-02-01

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