Effects of Cl incorporation during Si oxidation
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Published:1994-09
Issue:5
Volume:12
Page:3031
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
1 articles.
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1. Role of Oxygen in Poly-Si Etching byCl2/O2Plasmas;Japanese Journal of Applied Physics;1995-12-30