Low-temperature (≤200 °C) plasma enhanced atomic layer deposition of dense titanium nitride thin films-Reference-Cited by-同舟云学术

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Low-temperature (≤200 °C) plasma enhanced atomic layer deposition of dense titanium nitride thin films

Published:2013-01 Issue:1 Volume:31 Page:01A137
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Samal Nigamananda,Du Hui,Luberoff Russell,Chetry Krishna,Bubber Randhir,Hayes Alan,Devasahayam Adrian

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4769204

Cited by 21 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. An Improved Model for Molar Volumes of Ti-Carbide, Ti-Nitride and Ti-Carbo-Nitride;Metallurgical and Materials Transactions A;2024-04-11

2. Research Trends of Atomic Layer Deposition of Metal Nitrides and Their Applications in Semiconductor Industry;Ceramist;2024-03-31

3. Growth of conformal TiN thin film with low resistivity and impurity via hollow cathode plasma atomic layer deposition;Journal of Vacuum Science & Technology A;2024-02-29

4. Optical properties of plasmonic titanium nitride thin films from ultraviolet to mid-infrared wavelengths deposited by pulsed-DC sputtering, thermal and plasma-enhanced atomic layer deposition;Optical Materials;2023-09

5. Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments;Journal of Vacuum Science & Technology A;2023-03-06

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