Argon clustering in silicon under low-energy irradiation: Molecular dynamics simulation with different Ar–Si potentials-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Argon clustering in silicon under low-energy irradiation: Molecular dynamics simulation with different Ar–Si potentials

Published:2018-11 Issue:6 Volume:36 Page:061303
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Sycheva Anastasia A.¹,Voronina Ekaterina N.¹,Rakhimova Tatyana V.²,Rakhimov Alexander T.¹

Affiliation:

1. Skobeltsyn Institute of Nuclear Physics and Faculty of Physics, Lomonosov Moscow State University, 1(2), Leninskie gory, Moscow 119991, Russia

2. Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University, 1(2), Leninskie gory, Moscow 119991, Russia

Funder

Russian Science Foundation

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5050325

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Comparison of glancing-angle scatterings on different materials in a high aspect ratio plasma etching process using molecular dynamics simulation;Journal of Vacuum Science & Technology A;2022-09

2. Material removal and surface evolution of single crystal silicon during ion beam polishing;Applied Surface Science;2021-04

3. Irradiation of nanoporous structures with light and heavy low-energy ions: Sputtering enhancement and pore sealing;Journal of Vacuum Science & Technology A;2020-09

4. Molecular-Dynamics Simulation of Silicon Irradiation with Low-Energy Noble Gas Ions;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2020-07

5. Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration;Materials Advances;2020

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3