Detailed characterization of TiC and TiN coatings prepared by the activated reactive evaporation process-Reference-Cited by-同舟云学术

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Detailed characterization of TiC and TiN coatings prepared by the activated reactive evaporation process

Published:1987-07 Issue:4 Volume:5 Page:2732-2736
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Lin P.,Deshpandey C.,Doerr H. J.,Bunshah R. F.,Kaufherr N.,Nielsen R.,Fenske G.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.574730

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. X-ray photoelectron spectroscopy analyses of titanium oxynitride films prepared by magnetron sputtering using air/Ar mixtures;Thin Solid Films;2009-07

2. Study by AES of the titanium nitruration in the growing of TiN thin films by PLD technique;Applied Surface Science;2006-03

3. Low temperature, fast deposition of metallic titanium nitride films using plasma activated reactive evaporation;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2005-05

4. Characterization of titanium nitride films deposited by cathodic arc plasma technique on copper substrates;Surface and Coatings Technology;2000-08

5. A multilayer approach to high adhesion diamond-like carbon coatings on titanium;Diamond and Related Materials;1997-04

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