Electrical properties of indium-tin oxide films deposited on nonheated substrates using a planar-magnetron sputtering system and a facing-targets sputtering system
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.2134711
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2. P-52: Morphological and Electrical Difference in C-axis Aligned Crystalline IGZO Films Based on the Sputtering Method;SID Symposium Digest of Technical Papers;2016-05
3. Smooth e-beam-deposited tin-doped indium oxide for III-nitride vertical-cavity surface-emitting laser intracavity contacts;Journal of Applied Physics;2015-10-14
4. Tantalum and Titanium doped In2O3 Thin Films by Aerosol-Assisted Chemical Vapor Deposition and their Gas Sensing Properties;Chemistry of Materials;2012-07-27
5. Reactive magnetron sputtering of transparent conductive oxide thin films: Role of energetic particle (ion) bombardment;Journal of Materials Research;2012-02-08
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