Focused helium and neon ion beam induced etching for advanced extreme ultraviolet lithography mask repair-Reference-Cited by-同舟云学术

Focused helium and neon ion beam induced etching for advanced extreme ultraviolet lithography mask repair

Published:2014-03 Issue:2 Volume:32 Page:021602
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Gonzalez Carlos M.,Timilsina Rajendra,Li Guoliang,Duscher Gerd,Rack Philip D.,Slingenbergh Winand,van Dorp Willem F.,De Hosson Jeff T. M.,Klein Kate L.,Wu Huimeng M.,Stern Lewis A.

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4868027

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