Room temperature plasma enhanced atomic layer deposition for TiO2and WO3films-Reference-Cited by-同舟云学术

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Room temperature plasma enhanced atomic layer deposition for TiO2and WO3films

Published:2016-01 Issue:1 Volume:34 Page:01A118
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Strobel Alexander,Schnabel Hans-Dieter,Reinhold Ullrich,Rauer Sebastian,Neidhardt Andreas

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4935356

Cited by 31 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Dye-sensitized materials;Reference Module in Earth Systems and Environmental Sciences;2024

3. Optical, Optoelectronic, and Third‐Order Nonlinear Photonics of Ultrathin Molybdenum Oxide Film Deposited by Atomic Layer Deposition;physica status solidi (a);2023-02-15

4. Plasma-enhanced atomic layer deposition of WO₃-SiO₂ films using a heteronuclear precursor;Journal of Vacuum Science & Technology A;2023-01

5. Cost-effective equipment for surface pre-treatment for cleaning and excitation of substrates in semiconductor technology;SN Applied Sciences;2022-12-13

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