Evaluation of a 100 kV thermal field emission electron-beam nanolithography system-Reference-Cited by-同舟云学术

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Evaluation of a 100 kV thermal field emission electron-beam nanolithography system

Published:2000 Issue:6 Volume:18 Page:3089
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Tennant D. M.,Fullowan R.,Takemura H.,Isobe M.,Nakagawa Y.

Publisher

American Vacuum Society

Subject

General Engineering

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