Patterning performance of EB-X3 x-ray mask writer-Reference-Cited by-同舟云学术

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Patterning performance of EB-X3 x-ray mask writer

Published:2000 Issue:6 Volume:18 Page:3084
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Ohki Shigehisa,Watanabe Toshifumi,Takeda Yuji,Morosawa Tetsuo,Saito Kenichi,Kunioka Tatsuya,Kato Junichi,Shimizu Akira,Matsuda Tadahito,Tsuboi Shinji,Aoyama Hajime,Watanabe Hiroshi,Nakayama Yoshinori

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mask for Proximity X-Ray Lithography;Handbook of Photomask Manufacturing Technology;2005-04-07

2. Fabrication of high resolution x-ray masks using diamond membrane for second generation x-ray lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2003

3. Defect printability analysis on electron projection lithography with diamond stencil reticle;Emerging Lithographic Technologies VI;2002-07-05

4. Tool and process optimization for 100-nm maskmaking using a 50-kV variable shaped e-beam system;21st Annual BACUS Symposium on Photomask Technology;2002-03-11

5. Precise x-ray mask writing technology using advanced 100-kV EB writer EB-X3;SPIE Proceedings;2001-09-05

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