Correlation of the growth rate for selective epitaxial growth of silicon and oxide thickness and oxide coverage in a reduced pressure chemical vapor deposition pancake reactor
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Published:2008
Issue:5
Volume:26
Page:1712
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ISSN:1071-1023
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:en
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
Electrical and Electronic Engineering,Condensed Matter Physics