Charging effects on trilevel resist with an e-beam lithography system-Reference-Cited by-同舟云学术

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Charging effects on trilevel resist with an e-beam lithography system

Published:1990-11 Issue:6 Volume:8 Page:1893
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Itoh Hiroyuki

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Anti-charging process for electron beam observation and lithography;Microelectronic Engineering;2013-10

2. High-resolution electron beam lithography for the fabrication of high-density dielectric metamaterials;Thin Solid Films;2007-02

3. Micro-optical elements fabricated by electron-beam lithography and dry etching technique using top conductive coatings;Microelectronic Engineering;2001-09

4. Computer modeling of charging-induced electron beam deflection in electron beam lithography;SPIE Proceedings;2000-06-02

5. Resist charging in electron beam lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1995-09

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