Surface processing with gas-cluster ions to improve giant magnetoresistance films-Reference-Cited by-同舟云学术

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Surface processing with gas-cluster ions to improve giant magnetoresistance films

Published:2001-07 Issue:4 Volume:19 Page:1207-1212
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Fenner D. B.,Hautala J.,Allen L. P.,Tetreault T. G.,Al-Jibouri A.,Budnick J. I.,Jones K. S.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1349193

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Evolution of magnetic anisotropy by O ion implantation in Fe/Co/Fe trilayar;Physica B: Condensed Matter;2019-10

2. Ion Beam Technology: Overview and History;Materials Processing by Cluster Ion Beams;2015-07-21

3. Progress and applications of cluster ion beam technology;Current Opinion in Solid State and Materials Science;2015-02

4. Historical milestones and future prospects of cluster ion beam technology;Applied Surface Science;2014-08

5. Surface roughening and rippling during plasma etching of silicon: Numerical investigations and a comparison with experiments;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2014-05

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