Growth Enhancement Effect of Gene Expression of Plants Induced by Active Oxygen Species in Oxygen Plasma-Reference-Cited by-同舟云学术

Growth Enhancement Effect of Gene Expression of Plants Induced by Active Oxygen Species in Oxygen Plasma

Published:2022 Issue: Volume: Page:201-225
ISSN:
Container-title:Agritech: Innovative Agriculture Using Microwaves and Plasmas
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Author:

Hayashi Nobuya

Publisher

Springer Singapore

Link

https://link.springer.com/content/pdf/10.1007/978-981-16-3891-6_12

Reference49 articles.

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3. Hayashi N, Nakahigashi A, Goto M, Kitazaki S, Koga K, Shiratani M. Redox characteristics of thiol compounds using radicals produced by water vapor radio frequency discharge. Jpn J Appl Phys. 2011;50(8S1):08JF04. https://doi.org/10.1143/JJAP.50.08JF04.

4. Kitazaki S, Koga K, Shiratani M, Hayashi N. Growth control of dry yeast using scalable atmospheric-pressure dielectric barrier discharge plasma irradiation. Jpn J Appl Phys. 2013;52(11):11PJ02. https://doi.org/10.1143/JJAP.51.11PJ02.

5. Volin JC, Denes FS, Young RA, Park SMT. Modification of seed germination performance through cold plasma chemistry technology. Crop Sci. 2000;40:1706–18. https://doi.org/10.2135/cropsci2000.4061706x.

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