1. T. Wei, K. Zhang, J. Wei, Y. Wang, L. Zhang, Micro/nanolithography of transparent thin films through laser-induced release of phase-transition latent-heat. Opt. Express 25, 28146–28156 (2017)
2. H. Miura, N. Iwata, N. Toyoshima, Y. Hayashi, K. Takeuchi, T. Mori, I. Hirosawa, Structure analysis of ZnS–SiO2 thin film and patterning by heat-mode lithography. in Optical Data Storage Topical Meeting, Conference Proceedings TuA5 (2006), pp. 129–131.
https://doi.org/10.1109/ods.2006.1632741
3. H. Miura, N. Toyoshima, Y. Hayashi, S. Sangu, N. Iwata, J. Takahashi, Patterning of ZnS–SiO2 by laser irradiation and wet etching. Jpn. J. Appl. Phys. 45, 1410–1413 (2006)
4. H. Miura, N. Toyoshima, K. Takeuchi, T. Mori, K. Hanaoka, Nanometer-scale patterning of ZnS–SiO2 by heat-mode lithography. in Ricoh Technical Report, vol. 33 (2007), pp. 36–43
5. T. Mori, M. Itoh, Unique ZnS–SiO2 morphologies reflecting a laser-induced heat distribution. Jpn. J. Appl. Phys. 52, 048004 (2013)