Multiwafer Process: Wafer Selection and Wafer Cleaning
Author:
Publisher
Springer Nature Singapore
Link
https://link.springer.com/content/pdf/10.1007/978-981-99-6649-3_10
Reference18 articles.
1. Choi WY, Park B-G, Lee JD. Fundamentals of Silicon IC Processes (4th ed.), Munundang, Aug. 2011. (ISBN 9788973937820).
2. En WG, et al. The Genesis Process/sup TM/: a new SOI wafer fabrication method. In: 1998 IEEE International SOI Conference Proceedings (Cat No. 98CH36199), Stuart. 1998. p. 163–4. https://doi.org/10.1109/SOI.1998.723162.
3. Song YS, Kim JH, Kim G, Kim H-M, Kim S, Park B-G. Improvement in self-heating characteristic by incorporating hetero-gate-dielectric in gate-all-around MOSFETs. IEEE J Electron Devices Soc. 2021;9:36–41. https://doi.org/10.1109/JEDS.2020.3038391.
4. Tayal S, et al. Incorporating bottom-up approach into device/circuit co-design for SRAM-based cache memory applications. IEEE Trans Electron Devices. 2022;69(11):6127–32. https://doi.org/10.1109/TED.2022.3210070.
5. Vodenitcharova T, Zhang LC, Zarudi I, Yin Y, Domyo H, Ho T. The effect of thermal shocks on the stresses in a sapphire wafer. IEEE Trans Semicond Manuf. 2006;19(4):449–54. https://doi.org/10.1109/TSM.2006.883591.
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