Author:
Nongthombam Sumitra,Swain Bibhu Prasad
Reference31 articles.
1. Ilican S, Gorgun K, Aksoy S, Caglar Y, Caglar M (2018) Fabrication of p-Si/n-ZnO: Al heterojunction diode and determination of electrical parameters. J Mol Struct 1156:675–683
2. Gashaw HF, Abza T (2019) Short review of factors affecting chemical bath deposition method for metal chalcogenide thin films. Int J Thin Fil Sci Tec 8:43–53
3. Ezekoye BA, Offor PO, Ezekoye VA, Ezema FI (2013) Chemical bath deposition technique of thin films: a review. IJSR- Int J Sci Res 2:452–456
4. Pawar SM, Pawar BS, Kim JH, Joo OS, Lokhande CD (2011) Recent status of chemical bath deposited metal chalcogenide and metal oxide thin films. Curr Appl Phys 11:117–161
5. Trejo-Ramos AI, González-Chan IJ, Oliva AI (2020) Physical properties of chemically deposited ZnS thin films: role of the solubility curves and species distribution diagrams. Mater Sci Semicond Process, 118
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献