Investigation of Electrical Parameters and Low-Frequency Noise Analysis of a Heterojunction TFET
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Publisher
Springer Singapore
Link
https://link.springer.com/content/pdf/10.1007/978-981-16-3767-4_27
Reference26 articles.
1. Moore GE (1998) Cramming more components onto integrated circuits. Proc IEEE 86:82–85https://doi.org/10.1109/JPROC.1998.658762
2. Sarangi S, Bhushan S, Santra A, Dubey S, Jit S, Tiwari PK (2013) A rigorous simulation based study of gate misalignment effects in gate engineered double-gate (DG) MOSFETs. Superlattices Microstruct 60:263–279. https://doi.org/10.1016/j.spmi.2013.05.009
3. Chaudhry A, Kumar MJ (2004) Controlling short-channel effects in deep-sub-micron SOI MOSFETs for improved reliability: a review. IEEE Trans Dev Mater Reliab 4:99–109. https://doi.org/10.1109/TDMR.2004.824359
4. Datta S, Liu H, Narayana V (2014) Tunnel FET technology: are liability perspective. Microelectron Reliab 54:861–874. https://doi.org/10.1016/j.microrel.2014.02.002
5. Lu H, Esseni D, Seabaugh AP (2015) Universal analytic model for tunnel FET circuit simulation. Solid State Electron 108:110–117. https://doi.org/10.1016/j.sse.2014.12.002
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