Development of a Method for Reducing the Impact of Metal Interconnection Parameters on the Speed of VLSI

Author:

Avdalyan NarekORCID,Petrosyan Armen

Publisher

Springer Nature Singapore

Reference12 articles.

1. Kumar A (2012) Study the performance analysis of carbon nanotube as a VLSI interconnect. Patiala: Thapar University, p 101. http://hdl.handle.net/10266/1898

2. Jaing Y (2006) Modeling and optimization of VLSI interconnects. USA: Nevada Las Vegas. Department Elect and Computer Engineering, University of Nevada Las Vegas, p 100

3. The international technology roadmap for semiconductors. URL: http://www.itrs2.net (20.07.2018)

4. Ismail I, Friedman EG (2002) Effects of inductance on the propagation delay and repeater insertion in VLSI circuits: a summary. Circ Syst Soc Outstand Young Author Award 8(2):195–206

5. Abinash R, Noha M (2007) Effects of coupling capacitance and inductance on delay uncertainty and clock skew. USA: Illinois Chicago. Department of Elect. and Computer Engineering. University of Illinois at Chicago, pp 184–187

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