In-Process Measurement of Subwavelength Structures
Publisher
Springer Singapore
Reference30 articles.
1. Aigouy L, Lahrech A, GrÃsillon S, Cory H, Boccara AC, Rivoal JC (1999) Polarization effects in Apertureless scanning near-field optical microscopy: an experimental study. Opt Lett 24(4):187–189
2. Balla T, Spearing SM, Monk A (2008) An assessment of the process capabilities of nanoimprint lithography. J Phys D Appl Phys 41:174001–174010
3. Bruzzone AAG, Costa HL, Lonardo PM, Lucca DA (2008) Advances in engineered surfaces for functional performance. Ann CIRP 57(2):750–769
4. Calaon M, Hansen HN, Tosello G, Garnaes J, Norregaard J, Li W (2015) Microfluidic chip designs process optimization and dimensional quality control. Microsyst Technol 21:561–570
5. Chou SY, Krauss PR, Renstom PJ (1996) Nanoimprint lithography. J Vac Sci Technol B 14:4129–4133