Galvanic Corrosion Inhibitors for Cu/Ru Couple During Chemical Mechanical Polishing of Ru
Publisher
Springer Singapore
Reference21 articles.
1. Brusic V, Frisch MA, Eldridge BN, Novak FP, Kaufman FB, Rush BM, Frankel GS (1991) Copper corrosion with and without inhibitors. J Electrochem Soc 138(8):2253–2259
2. Chen CCA, Hsieh CH (2010) Effect of inhibiter concentration on Cu CMP slurry analyzed by a Cu-ECMP system. ECS Trans 33(10):107–113
3. Chen JH, Lin ZC, Chen S, Nie LH, Yao SZ (1998) An XPS and BAW sensor study of the structure and real-time growth behaviour of a complex surface film on copper in sodium chloride solutions (pH = 9), containing a low concentration of benzotriazole. Electrochim Acta 43(3–4):265–274
4. Copson HR (1943) Distribution of galvanic corrosion. Trans Electrochem Soci 84(1):71–82
5. Costa SFLA, Agostinho SML, Rubim JC (1990) Spectroelectrochemical study of passive films formed on brass electrodes in 0.5 m H2SO4 aqueous solutions containing benzotriazole (BTAH). J Electroanal Chem 295(1–2):203–214