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A Micromachined Silicon Resonant Pressure Sensor

Published:2017 Issue: Volume: Page:1-34
ISSN:2542-761X
Container-title:Toxinology
language:
Short-container-title:

Author:

Wang Junbo,Chen Deyong,Xie Bo,Chen Jian,Zhu Lin,Lu Yulan

Publisher

Springer Netherlands

Link

http://link.springer.com/content/pdf/10.1007/978-981-10-2798-7_15-1

Reference67 articles.

1. Abdolvand R, Ayazi F (2008) An advanced reactive ion etching process for very high aspect-ratio sub-micron wide trenches in silicon. Sens Actuators A Phys 144(1):109–116

2. Beeby SP, Ensell G, Baker BR et al (2000) Micromachined silicon resonant stain gauges fabricated using SOI wafer technology. IEEE J MEMS 9:104–111

3. Bhardwaj JK, Ashraf H (1995) Advanced silicon etching using high-density plasmas. In: Proceedings of SPIE – the international society for optical engineering, Orlando

4. Borenstein JT, Gerrish ND (1997) Etch selectivity of novel epitaxial layers for bulk micromachining. MRS Online Proc Lib 546

5. Cabuz C, Shoji S, Fukatsu K et al (1994) Fabrication and packaging of a resonant infrared sensor integrated in silicon. Sens Actuators A Phys 43:92–99

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1. Analysis of a micro-resonant pressure sensor with docked clamped-clamped micro-beam;INTERNATIONAL CONFERENCE ON ADVANCES IN MULTI-DISCIPLINARY SCIENCES AND ENGINEERING RESEARCH: ICAMSER-2021;2022

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