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Emission characteristics of debris from CO2 and Nd:YAG laser-produced tin plasmas for extreme ultraviolet lithography light source

  • Published:2008-06-13 Issue:1 Volume:92 Page:73-77
  • ISSN:0946-2171
  • Container-title:Applied Physics B
  • language:en
  • Short-container-title:Appl. Phys. B

Author:

Takahashi A.,Nakamura D.,Tamaru K.,Akiyama T.,Okada T.

Publisher

Springer Science and Business Media LLC

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 22 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. EUV debris mitigation using magnetic nulls;Applied Physics Letters;2023-07-24

2. Tin removal by an annular surface wave plasma antenna in an extreme ultraviolet lithography source;Journal of Applied Physics;2022-09-21

3. EUV Sources;Handbook of Laser Micro- and Nano-Engineering;2021

4. EUV Sources;Handbook of Laser Micro- and Nano-Engineering;2021

5. Controlling ion kinetic energy distributions in laser produced plasma sources by means of a picosecond pulse pair;Journal of Applied Physics;2018-08-07
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