Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target-Reference-Cited by-同舟云学术

Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target

Published:2010-11-23 Issue:4 Volume:101 Page:773-789
ISSN:0946-2171
Container-title:Applied Physics B
language:en
Short-container-title:Appl. Phys. B

Author:

Rakowski R.,Bartnik A.,Fiedorowicz H.,de Gaufridy de Dortan F.,Jarocki R.,Kostecki J.,Mikołajczyk J.,Ryć L.,Szczurek M.,Wachulak P.

Publisher

Springer Science and Business Media LLC

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://link.springer.com/content/pdf/10.1007/s00340-010-4327-9

Reference56 articles.

1. J. Jonkers, Plasma Sources Sci. Technol. 15, S8 (2006)

2. S. Wurm, EUVL manufacturing insertion, Solid State Technology Online 23, October (2006)

3. V. Banine, R. Moors, J. Phys. D, Appl. Phys. 37, 3207 (2004)

4. U. Stamm, J. Phys. D, Appl. Phys. 37, 3244 (2004)

5. K. Wakana, T. Abe, Y. Watanabe, T. Ishihara, T. Hori, T. Ohta, A. Kurosu, H. Komori, H. Nakarai, K. Kakizaki, A. Sumitani, J. Fujimoto, H. Mizoguchi, Future of high power EUV sources (presentation at http://www.euvlitho.com/2010/ABSTRACTS%202010%20EUVL%20Workshop.pdf )

Cited by 55 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A method for calculating the mean ion charge in a short-lived non-equilibrium plasma—Its application to diagnostics of the laser spark;Journal of Applied Physics;2023-12-15

2. Study of Emission Spectra of Cl-, Br-, and I-Containing Targets in the 3‒6.5 nm Spectral Range under Pulsed Laser Irradiation;Bulletin of the Lebedev Physics Institute;2023-12

3. Discharge in a Nonhomogeneous Gas Flow Sustained by Powerful Novosibirsk Free Electron Laser Emission as a Point-Like Source of Vacuum Ultraviolet Radiation;Bulletin of the Russian Academy of Sciences: Physics;2023-11

4. The development of laser-produced plasma EUV light source;Chip;2022-09

5. SiC and Ion collectors as diagnostics of laser-generated plasma at intensity of 10¹⁰W/cm²;Journal of Instrumentation;2022-04-01