Characterization of Microroughness Parameters in Titanium Nitride Thin Films Grown by DC Magnetron Sputtering-Reference-Cited by-同舟云学术

Characterization of Microroughness Parameters in Titanium Nitride Thin Films Grown by DC Magnetron Sputtering

Published:2012-01-28 Issue:6 Volume:31 Page:586-590
ISSN:0164-0313
Container-title:Journal of Fusion Energy
language:en
Short-container-title:J Fusion Energ

Author:

Gelali Ali,Ahmadpourian Azin,Bavadi Reza,Hantehzadeh M. R.,Ahmadpourian Arman

Publisher

Springer Science and Business Media LLC

Subject

Nuclear Energy and Engineering,Nuclear and High Energy Physics

Link

http://link.springer.com/content/pdf/10.1007/s10894-012-9510-z.pdf

Reference17 articles.

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3. A.A. Gewirth, B.K. Niece, Chem. Rev. 97, 1129 (1997)

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5. O.M. Magnussen, F.A. Moller, A. Lachenwitzer, R.J. Behm, in Electrochemical Synthesis and Modification of Materials, Materials Research Society Symposium Proceedings, vol. 451 (1997), p. 43

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