Stray Capacitance in a Plasma Focus Device: Implications on the Current Derivative Calibration and the Effective Discharge Current-Reference-Cited by-同舟云学术

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Stray Capacitance in a Plasma Focus Device: Implications on the Current Derivative Calibration and the Effective Discharge Current

Published:2017-03-24 Issue:2-3 Volume:36 Page:87-91
ISSN:0164-0313
Container-title:Journal of Fusion Energy
language:en
Short-container-title:J Fusion Energ

Author:

Bruzzone H.,Acuña H.,Barbaglia M.,Milanese M.,Clausse A.

Publisher

Springer Science and Business Media LLC

Subject

Nuclear Energy and Engineering,Nuclear and High Energy Physics

Link

http://link.springer.com/content/pdf/10.1007/s10894-017-0126-1.pdf

Reference10 articles.

1. H. Bruzzone, H. Acuña, Plasma Sources Sci. Technol. 15, 489 (2006)

2. H. Bruzzone, H. Acuña, A. Clausse, Plasma Phys. Control. Fusion 49, 105 (2007)

3. H. Bruzzone, H. Acuña, A. Clausse, Braz. J. Phys. 38, 117 (2008)

4. M. Barbaglia, H. Bruzzone, H. Acuña, L. Soto, A. Clausse, Plasma Phys. Control. Fusion 51, 45001 (2009)

5. H. Bruzzone, R. Vieytes, Plasma Phys. Control. Fusion 35, 1745 (1993)

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2. On the Use of UHF Sensors in the Detection and Characterization of Pulsed Plasma Discharges;Lecture Notes in Electrical Engineering;2019-11-28

3. Introducing an Inductive Loop Sensor as an Alternative to Record the Phenomena of a Dense Plasma Focus of 400 J;Lecture Notes in Electrical Engineering;2019-11-28

4. On the Relationship Between the Electromagnetic Burst and Inductive Sensor Measurement of a Pulsed Plasma Accelerator;IEEE Access;2019

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