Electron Density and Electron Temperature Control with a Magnetic Field and a Grid in Inductively Coupled Argon Plasma-Reference-Cited by-同舟云学术

Electron Density and Electron Temperature Control with a Magnetic Field and a Grid in Inductively Coupled Argon Plasma

Published:2022-10-28 Issue:1 Volume:43 Page:381-400
ISSN:0272-4324
Container-title:Plasma Chemistry and Plasma Processing
language:en
Short-container-title:Plasma Chem Plasma Process

Author:

He Yun-peng,Jin Wei,Wang Yi-bo,Lv Shao-bo,Wang Rui-sheng,Liu Jun-qi,Liu Hai-cheng

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Link

https://link.springer.com/content/pdf/10.1007/s11090-022-10295-7.pdf

Reference15 articles.

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2. Shimizu T, Kato K, Li Y et al (2001) Electron temperature and ion energy control in modified magnetron-typed RF discharge. Thin Solid Films 386(2):248–251

3. Ikada R, Nishimura G, Kato K et al (2004) Production of high density and low electron-temperature plasma by a modified grid-biasing method using inductively coupled RF discharge. Thin Solid Films 457(1):55–58

4. Hong JI, Seo SH, Kim SS et al (1999) Electron temperature control with grid bias in inductively coupled argon plasma. Phys Plasmas 6(3):1017–1028

5. Kim KN, Lim JH, Park JK et al (2014) Characteristics of plasma using a ferromagnetic enhanced inductively coupled plasma source. Jpn J Appl Phys 47(9 issue 1):7339–7342

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