Effective Removal of CF4 by Combining Nonthermal Plasma with γ-Al2O3

Author:

Pan Kuan Lun,Chen Ya Sheng,Chang Moo Been

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Reference44 articles.

1. Kuroki T, Mine J, Odahara S, Okubo M, Yamamoto T, Saeki N (2005) CF4 decomposition of flue gas from semiconductor process using inductively coupled plasma. IEEE Trans Ind Appl 41:221–228

2. Lee HM, Chen SH (2017) Thermal abatement of perfluorocompounds with plasma torches. Energy Procedia 142:3637–3643

3. Qin L, Han J, Wang G, Kim HJ, Kawaguchi I (2010) Highly efficient decomposition of CF4 gases by combustion. In: Conference on environmental pollution and public health, pp 126–130

4. Jia L, Ma S (2005) The experimental study on high temperature air combustion and CF4 decomposition. ASME Summer Heat Transf Conf 2005:705–708

5. Ou Yang CF, Kam EH, Liu CH, Tzou J, Wang JL (2009) Assessment of removal efficiency of perfluorocompounds (PFCs) in a semiconductor fabrication plant by gas chromatography. Chemosphere 76:1273–1277

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