System for In Situ Characterization of Nanoparticles Synthesized in a Thermal Plasma Process-Reference-Cited by-同舟云学术

System for In Situ Characterization of Nanoparticles Synthesized in a Thermal Plasma Process

Published:2005-10 Issue:5 Volume:25 Page:439-453
ISSN:0272-4324
Container-title:Plasma Chemistry and Plasma Processing
language:en
Short-container-title:Plasma Chem Plasma Process

Author:

Wang X.,Hafiz J.,Mukherjee R.,Renault T.,Heberlein J.,Girshick S. L.,McMurry P. H.

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s11090-005-4991-4.pdf

Reference33 articles.

1. A Phenomenlogical Study of Particulates in Plasma Tools and Processes

2. Growth Kinetics and Behavior of Dust Particles in Silane Plasmas

3. L. Boufendi, W. Stoffels, and E. Stoffels, in: Dusty Plasmas: Physics, Chemistry and Technological Impacts in Plasma Processing (A. Bouchoule, ed.). John Wiley & Sons Ltd, New York 1999.

4. Exhaust Aerosol of a Plasma Enhanced CVD System: I. Size Distribution Measurements

5. Exhaust Aerosol of a Plasma Enhanced CVD System: II. Electrical Charging and Transport

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