Hydrogen Plasmas Processing of Graphene Surfaces-Reference-Cited by-同舟云学术

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Hydrogen Plasmas Processing of Graphene Surfaces

Published:2015-11-26 Issue:1 Volume:36 Page:213-229
ISSN:0272-4324
Container-title:Plasma Chemistry and Plasma Processing
language:en
Short-container-title:Plasma Chem Plasma Process

Author:

Despiau-Pujo Emilie,Davydova Alexandra,Cunge Gilles,Graves David B.

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s11090-015-9683-0.pdf

Reference72 articles.

1. Sun Z, James DK, Tour JM (2011) J Phys Chem Lett 2:2425–2432

2. Schwierz F (2010) Nat Nanotechnol 5:487–496

3. Segal M (2012) Nature 483:S43–S44

4. Biró LP, Nemes-Incze P, Lambin P (2012) Nanoscale 4:1824

5. Eda G et al (2008) Nat Nanotechnol 3(5):270–274

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3. Engineering SYK Interactions in Disordered Graphene Flakes under Realistic Experimental Conditions;Physical Review Letters;2023-07-18

4. Enabling high quality dielectric passivation on Monolayer WS2 using a sacrificial Graphene Oxide template;2023-02-21

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